http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007129589-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2007-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2007129589-A1 |
| titleOfInvention | Photosensitive resin composition |
| abstract | Photosensitive resin composition excellent in sensitivity, resolution, and adhesion, having good hue stability such as color development and decolorization during storage of a dry film, and developable with an alkaline aqueous solution, and photosensitive resin using the photosensitive resin composition The following composition is used for the purpose of providing a laminate, a method of forming a resist pattern on a substrate using the photosensitive resin laminate, and a use of the resist pattern. (A) Thermoplastic copolymer containing an α, β-unsaturated carboxyl group-containing monomer as a copolymerization component and having an acid equivalent of 100 to 600 and a weight average molecular weight of 5,000 to 500,000: 20 to 90 Mass%, (b) addition polymerizable monomer having at least one terminal ethylenically unsaturated group: 5 to 75 mass%, (c) photopolymerization initiator: 0.01 to 30 mass%, (d) phosphorous acid Ester compound: 0.01-5 mass%, (e) Basic dye: The photosensitive resin composition characterized by containing 0.001-0.3 mass%. |
| priorityDate | 2006-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 318.