http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007119699-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2007-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2007119699-A1 |
| titleOfInvention | Photosensitive resin composition and photosensitive element using the same |
| abstract | (A) a base polymer having a repeating unit represented by the following general formula (1), (B) an acrylic polymer having a photopolymerizable unsaturated group, (C) an inorganic filler, and (D) photopolymerizability. A photosensitive element provided with the photosensitive resin composition containing a monomer and (E) photoreaction initiator, and the photosensitive resin composition layer formed using this. [In the formula (1), R 1 represents a divalent organic group which is a diglycidyl ether type epoxy compound residue, R 2 represents a divalent organic group which is a dibasic acid residue, R 3 and R 4 each independently represents a hydrogen atom or the following general formula (2); (In formula (2), R 5 represents an acid anhydride residue.). ] |
| priorityDate | 2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 212.