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filingDate 2007-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2007091412-A1
titleOfInvention Pattern film forming method and pattern film forming apparatus
abstract The present invention can form a dense and defect-free conductive pattern even at low temperature treatment, and when the pattern film is formed with the same thickness as the conventional method, it has excellent physical properties such as conductivity, film strength, and transmittance, A pattern film forming method and a pattern film forming apparatus capable of stably forming a pattern film with improved stability under high temperature and high humidity without a missing pattern film using a simple apparatus. In this pattern film forming method, a thin film having a predetermined pattern shape is applied on a substrate using a solution containing metal ions, and then the thin film is subjected to atmospheric pressure plasma treatment to form a pattern film. Features.
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