http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007072613-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L51-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L53-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L53-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F279-02 |
| filingDate | 2006-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2007072613-A1 |
| titleOfInvention | Elastomer structure and photosensitive composition using the same |
| abstract | Elastomer structure suitable for printing plate materials, laser processing characteristics using this elastomer structure, image developability, clear printability even with small letters, and excellent water developability when a hydrophilic polymer is added A photosensitive composition is provided. A polymer block mainly composed of at least two aromatic vinyl compounds, a polymer block mainly composed of at least one conjugated diene, a copolymer block having a specific structure, and mainly composed of one or more conjugated dienes And an elastomer composition comprising as a main component a block (co) polymer which may contain one or more aromatic vinyl compound polymer blocks, and the elastomer composition, photopolymerization A photosensitive composition containing a polymerizable unsaturated monomer and a photopolymerization initiator. |
| priorityDate | 2005-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 225.