http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007043517-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76865 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31055 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2006-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2007043517-A1 |
| titleOfInvention | Polishing liquid and polishing method for CMP |
| abstract | According to the present invention, by suppressing the movement of electrons in the vicinity of the boundary between the barrier conductor and the conductive material such as copper, the wiring corrosion of the conductive material, that is, the dissimilar metal contact corrosion between the barrier conductor and the conductive material. It is possible to provide a CMP polishing liquid that is suppressed. The present invention is a polishing liquid for polishing at least a conductive layer and a conductive material layer in contact with the conductive layer, wherein the positive electrode side of the electrometer is connected to the conductive material and the negative electrode side is connected to the conductor in the polishing liquid. The polishing liquid for CMP in which the absolute value of the potential difference at 50 ± 5 ° C. of the conductive material and conductor is 0.25 V or less. Preferably, it contains at least one selected from heterocyclic compounds containing any one of a hydroxyl group, a carbonyl group, a carboxyl group, an amino group, an amide group and a sulfinyl group and containing at least one of a nitrogen atom and a sulfur atom. |
| priorityDate | 2005-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 123.