http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007023710-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2006-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2007023710-A1 |
| titleOfInvention | Lithographic coating-type underlayer film forming composition containing vinyl naphthalene resin derivative |
| abstract | PROBLEM TO BE SOLVED: To prevent a resist pattern from collapsing after development with the miniaturization of a resist pattern, applied to a multilayer film process using a thin film resist, having a lower dry etching rate than a photoresist or a semiconductor substrate, When processing, it has sufficient etching resistance to the processed substrate. A coating-type underlayer film forming composition for use in a lithography process using a multilayer film comprising a polymer containing a vinyl naphthalene-based unit structure and an acrylic acid-based unit structure containing an aromatic hydroxyl group or a hydroxyl group-containing ester. Furthermore, the coating type lower layer film formation composition containing the acrylic acid unit structure containing an aliphatic cyclic compound containing ester or an aromatic compound containing ester. [Selection figure] None |
| priorityDate | 2005-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 225.