| abstract |
A radiation-sensitive resin composition that is highly transparent to radiation and excellent in basic physical properties as a resist, such as sensitivity, resolution, and pattern shape, in particular, high resolution, wide DOF, and excellent LER, a polymer that can be used in the composition, and A novel compound used in this polymer synthesis is provided. The novel compound is represented by the following formula (2). In Formula (2), R 4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, and at least one of Rf represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms. A represents a divalent organic group or a single bond, G represents a divalent organic group or a single bond containing a fluorine atom, M m + represents a metal ion or an onium cation, and m represents 1 to 3 P represents a natural number of 1 to 8, respectively. |