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filingDate 2006-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2008-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2006106872-A1
titleOfInvention Plasma doping method and apparatus
abstract An object of the present invention is to provide a plasma doping method and apparatus excellent in uniformity of impurity concentration introduced into a sample surface. The plasma doping apparatus of the present invention introduces a predetermined gas from a gas supply device (2) into a vacuum vessel (1), and a turbo molecular pump (3) as an exhaust device through an exhaust port (11). Exhaust is performed, and the inside of the vacuum vessel (1) is maintained at a predetermined pressure by the pressure regulating valve (4). Then, the high frequency power supply (5) supplies high frequency power of 13.56 MHz to the coil (8) provided in the vicinity of the dielectric window (7) facing the sample electrode (6), whereby the vacuum container (1). An inductively coupled plasma is generated inside. A high frequency power source (10) for supplying high frequency power to the sample electrode (6) is provided. The total opening area of the gas blowing port (15) provided facing the central portion of the sample electrode (6) is the gas blowing port (15) provided facing the peripheral portion of the sample electrode (6). By making it smaller than the total of the opening area, the uniformity was increased.
priorityDate 2005-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.