http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006098109-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2001 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 |
| filingDate | 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2006098109-A1 |
| titleOfInvention | Plasma doping method and apparatus |
| abstract | A plasma doping method and apparatus excellent in controllability of impurity concentration introduced into a sample surface are provided. While introducing a predetermined gas from the gas supply device 2 into the vacuum vessel 1, the turbo molecular pump 3 as an exhaust device is evacuated through the exhaust port 11, and the pressure regulator 4 is used to evacuate the vacuum vessel 1 with a predetermined pressure. Keep on. By supplying high frequency power of 13.56 MHz to the coil 8 provided in the vicinity of the dielectric window 7 facing the sample electrode 6 by the high frequency power source 5, inductively coupled plasma is generated in the vacuum vessel 1. A high frequency power source 10 for supplying high frequency power to the sample electrode 6 is provided. Every time a predetermined number of samples are processed, the dummy sample is heated after plasma doping, and the conditions for processing the samples are controlled so that the measured value of the sheet resistance of the surface becomes a predetermined value. Controllability can be improved. |
| priorityDate | 2005-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.