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filingDate 2006-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2008-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2006093089-A1
titleOfInvention Method for manufacturing polycrystalline silicon substrate, method for manufacturing photoelectric conversion element, and method for manufacturing photoelectric conversion module
abstract Regarding the impurity concentration in the polycrystalline silicon substrate, when the boron concentration analyzed by SIMS is [B] and the substitution position carbon concentration analyzed by FTIR is [Cs], the region excluding the 1 cm wide region at the substrate edge, [B] ≧ 1E16 [atoms / cm 3 ] and [Cs] ≦ 2E17 [atoms / cm 3 ] Meet the polycrystalline silicon substrate. The Voc improvement width becomes larger than the conventional one, and Jsc is greatly improved. Thereby, a highly efficient polycrystalline silicon solar cell can be obtained.
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