| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-0306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-185 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-0306 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C233-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C231-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F291-10 |
| filingDate |
2005-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2008-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2006080178-A1 |
| titleOfInvention |
Metal pattern forming material, crosslinkable monomer, and metal pattern forming method |
| abstract |
A method for forming a metal pattern formed by chemically adsorbing a metal, a pattern forming material used therefor, and a crosslinkable monomer are provided. A development process and a rinsing process with a pure water solution having a pH of less than 7 using a pattern forming material comprising (A) a matrix polymer having at least one of a carboxyl group and a sulfonic acid group in the composition on the surface of the substrate Forming a pattern by a photolithography method including, and immersing the pattern in an aqueous solution containing a metal compound to chemically adsorb metal ions or metal compound complex ions to the pattern to form a metal-containing pattern. And a step of firing the metal-containing pattern to form a metal simple substance or a metal pattern containing a metal oxide thereto. Moreover, what contained the condensate of a polyhydric alcohol and N-methylol (meth) acrylamide was used for the crosslinkable monomer. |
| priorityDate |
2005-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |