http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005113617-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2005-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2005113617-A1 |
| titleOfInvention | (Meth) acrylic acid ester, polymer, and resist composition |
| abstract | The polymer of the present invention contains a structural unit having a specific acetal skeleton represented by the following formula (1), and can be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography and the like. it can. [Chemical 1] (In formula (1), R represents a hydrogen atom or a methyl group. R 1 and R 2 each independently represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, or R 1 and R 2 are Together form a ring structure, A 1 represents a single bond, alkylene, oxyalkylene, —C (O) O— or —CH 2 CH 2 OC (O) —, wherein A 2 represents a single bond, alkylene, Represents oxyalkylene, —CO—, —C (O) O— or —C (O) OCH 2 CH 2 —, wherein Z represents an optionally substituted cyclohexane ring, norbornane ring, bicyclo [2. 2.2] octane ring or tetracyclo [4.4.0.1 2, 5] dodecane ring.) |
| priorityDate | 2004-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 173.