http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005090511-A1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
filingDate 2005-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2008-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2005090511-A1
titleOfInvention Polishing composition and polishing method
abstract An object of the present invention is to improve the polishing rate by a polishing composition containing silica fine particles, water, a basic substance, and an inorganic salt and a polishing method using the same in polishing treatment of a semiconductor substrate, a hard disk substrate and the like. I have to. This polishing composition can be produced by mixing silica fine particles, water, a basic substance, and an inorganic salt, but can also be obtained by adding an inorganic salt to a conventionally known silica fine particle-containing alkaline polishing composition. . At this time, inorganic salts include alkali metal salts such as KCl, K 2 SO 4 , KNO 3 , NaCl, Na 2 SO 4 , NaNO 3 , NH 4 Cl, NH 4 NO 3 , (NH 4 ) 2 SO 4 , An ammonium salt or the like is used. When an inorganic salt is added, the polishing rate is remarkably improved when the polishing composition does not generate an aggregate of silica fine particles.
priorityDate 2004-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002226836-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000008024-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002038131-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001093866-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID223
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4873
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448736812
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24507
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID22985
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451203358
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451597188
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25517
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559564
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448670727
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448605289
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453569306
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5234
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453492911
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24268
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24434
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962

Total number of triples: 40.