http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005088396-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2005-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2005088396-A1 |
| titleOfInvention | Positive photosensitive resin composition, relief pattern using the same, and solid-state imaging device |
| abstract | It is almost insoluble in alkaline developer before exposure, and can be easily dissolved in alkaline developer upon exposure to resolve fine patterns, and can be used for optical elements with high transparency, high refractive index and lens shape The composition which can make is provided. (A) 1 to 30 parts by weight of a compound that absorbs light at an exposure wavelength but does not fade by the light with respect to 100 parts by weight of a polymer having an alkali-soluble group, and (c) 1 to 1 part of a quinonediazide compound. Positive photosensitive resin composition comprising 50 parts by weight, (d) 5 to 500 parts by weight of inorganic particles having a particle diameter of 1 nm to 30 nm selected from at least one selected from aluminum compounds, silicon compounds, tin compounds, titanium compounds, and zirconium compounds Is used. |
| priorityDate | 2004-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 307.