http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005085301-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-102 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-1006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-06 |
| filingDate | 2005-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2005085301-A1 |
| titleOfInvention | Resist polymer, resist composition, pattern manufacturing method, and resist polymer raw material compound |
| abstract | In DUV excimer laser lithography or the like, a resist polymer containing an acid-decomposable unit represented by the following formula (1) or (2) as a constituent unit with small line edge roughness and few defects is provided. (N is an integer of 2 to 24. J is a divalent hydrocarbon group which may have a single bond or a substituent / heteroatom when n = 2, and a substituent / heteroatom when n ≧ 3. And N represents a residue of a polymerization terminator, a chain transfer agent, and a polymerization initiator, and K 1 and K 2 represent alkylene, cycloalkylene, oxyalkylene, and arylene. At least one of a divalent thiazoline ring, a divalent oxazoline ring, and a divalent imidazoline ring, L 1 and L 2 are —C (O) O—, —C (O) —, —OC (O) —. At least one of M 1 , M 2 , and M 3 is at least one of alkylene, cycloalkylene, oxyalkylene, and arylene, and Y, Y 1 , and Y 2 each represent an acid-decomposable bond, k 1, k 2, l 1, l 2, m 1 , m2, m3 is 0 or 1 .R 1 is H or It represents a methyl group.) |
| priorityDate | 2004-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 260.