http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005044777-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-4676 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-285 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F22-1006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-82 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-83 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-20 |
| filingDate | 2004-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2005044777-A1 |
| titleOfInvention | Tetra(meth)acrylate compound, curable composition containing the same, and cured products thereof |
| abstract | The (meth)acrylate compound represented by the following general formula (1) and the curable composition containing the same can be used for various applications such as resist inks, paints and molding materials. In addition to the tetra(meth)acrylate compound (B), an alkali-soluble carboxyl group-containing compound (A), a polymerization initiator (C), a diluting solvent (D), and 2 or more in one molecule. A curable composition containing a compound (E) having a cyclic ether, a curing catalyst (F), etc. is used for producing a solder resist, an etching resist, a plating resist of a printed wiring board, an interlayer insulating layer of a multilayer wiring board, a tape carrier package. It is useful for applications such as permanent masks used in, and resists for color filters. (However, R1, R2, R3, and R4 represent a hydrogen atom or a methyl group, and X represents a dicarboxylic acid residue, preferably an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue.) |
| priorityDate | 2003-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 314.