| abstract |
Provided are a semiconductor cleaning liquid composition containing an unsaturated dicarboxylic acid and ethylene urea, and a cleaning method. The present invention is a composition for cleaning a residue in a semiconductor wafer processing step, and contains an unsaturated dicarboxylic acid and ethylene urea as essential components. Among the unsaturated dicarboxylic acids, maleic acid is particularly preferable. Preferred such compositions contain unsaturated dicarboxylic acid, ethylene urea, at least one other organic carboxylic acid excluding unsaturated dicarboxylic acid, at least one other basic compound excluding ethylene urea, and water. Moreover, you may add at least 1 sort (s) selected from the group which consists of an organic solvent, a chelating agent, surfactant, and phosphonic acid and / or phosphinic acid as an optional component to this preferable said composition. |