http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005043248-A1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D103-02 |
filingDate | 2004-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2007-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2005043248-A1 |
titleOfInvention | Underlayer film forming composition containing dextrin ester compound |
abstract | Lithographic underlayer film forming composition used in a lithography process for manufacturing semiconductor devices, and a lower layer film for lithography that has a higher dry etching rate than a photoresist and does not cause intermixing with the photoresist To provide. A composition for forming a lower layer film for lithography, comprising a dextrin ester compound in which at least 50% of hydroxyl groups are ester groups, a crosslinkable compound, and an organic solvent. |
priorityDate | 2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 340.