http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005001576-A1
Outgoing Links
Predicate | Object |
---|---|
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2006-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2005001576-A1 |
titleOfInvention | Positive photosensitive composition |
abstract | Applying under conditions where the humidity is 25-60% without burning, necessary and sufficient adhesion is obtained, development is possible with low alkali strength, development is possible with high sensitivity and no residue, and sharp Disclosed is a positive photosensitive composition that is cut at the contour, has a very hard resist film, and has improved scratch resistance in handling before development. (A) A polymer substance having at least one carboxyl group in the molecule, and (B) a photothermal conversion substance that absorbs infrared rays from an image exposure light source and converts it into heat are contained as essential components. |
priorityDate | 2003-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 151.