| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2437
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0894
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2240-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0875
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0813
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02T10-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2240-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2418 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N3-0892
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N3-2013
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2437
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F23J15-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F23J15-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F01N3-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F01N3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| filingDate |
2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2007-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2005001249-A1 |
| titleOfInvention |
Plasma generating electrode, plasma reactor, and exhaust gas purification device |
| abstract |
In the plasma generating electrode 1 of the present invention, a plurality of unit electrodes 2 are hierarchically stacked at a predetermined interval, and the unit electrode 2 includes a missing unit electrode 2b having a missing part of the conductive film 4, and a missing part. The normal space Va is formed of the normal unit electrodes 2a that are not provided, and the space V formed between the unit electrodes 2 is formed such that the distance between the conductive films 4 is the distance between the unit electrodes 2. And a gap space Vb formed between the normal unit electrodes 2a so that the distance between the conductive films 4 is longer than the distance between the conductive films 4 in the normal space Va. The plasma generating electrode 1 of the present invention can efficiently process a plurality of predetermined components contained therein by using a plurality of different plasmas suitable for each reaction by only flowing a fluid to be processed once. |
| priorityDate |
2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |