| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-492
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2004-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2006-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2004104702-A1 |
| titleOfInvention |
Chemically amplified positive photoresist composition and resist pattern forming method |
| abstract |
Provided is a chemically amplified positive photoresist composition having good bottle aging stability. A novolak resin or a hydroxystyrene resin is reacted with a crosslinking agent to form an alkali hardly soluble or insoluble resin having a property of increasing the solubility in an alkaline aqueous solution in the presence of an acid. A chemical amplification type positive photoresist composition having an acid component content of 10 ppm or less is dissolved in an organic solvent together with the generated compound. |
| priorityDate |
2003-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |