| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J45-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J47-127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J45-00 |
| filingDate |
2004-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2004084287-A1 |
| titleOfInvention |
Semiconductor polishing slurry refining material, semiconductor polishing slurry refining module, and semiconductor polishing slurry refining method |
| abstract |
Semiconductor polishing slurry refining material and semiconductor that can refine polishing slurry efficiently without changing pH, prevent metal contamination to the object to be treated as much as possible, and can carry out recycling of polishing slurry without any hindrance A polishing slurry purification module and a polishing slurry purification method using the same. A functional group having a metal chelate forming ability, or a functional group and a hydroxyl group are immobilized on at least the surface of the fiber base material. The raw material for refining the semiconductor polishing slurry is used, for example, so as to allow the polishing slurry to pass through a container having an inlet and an outlet of the polishing slurry. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011148063-A |
| priorityDate |
2003-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |