http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2004081065-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate | 2004-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2004081065-A1 |
| titleOfInvention | Acid sensitive copolymer and use thereof |
| abstract | Provided is a positive photosensitive resist composition that can use a photoacid generator with high sensitivity and is inexpensive, can be subjected to near-ultraviolet exposure and weak alkali development, has high resolution, and can be applied to a substrate having a through hole. A first structural unit derived from 4- (1-methylethenyl) phenol and / or 4-ethenylphenol, a second structural unit derived from (meth) acrylic acid esters, and (meth) acrylic acid alkoxyalkyl esters A positive photosensitive resist composition comprising an acid-sensitive copolymer comprising a third structural unit derived from |
| priorityDate | 2003-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 425.