http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2003100524-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2003-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2003100524-A1 |
| titleOfInvention | Radiation-sensitive resin composition, method for producing a substrate having a patterned resin film, and use of the resin composition |
| abstract | Contains alicyclic olefin resin, acid generator, crosslinking agent, phenolic compound with specific structure, and solvent, low dielectric constant, excellent transparency, heat discoloration, resolution, remaining film rate, pattern shape, etc. A radiation-sensitive resin composition capable of providing a resin film. A method for producing a substrate having a patterned resin film using the radiation-sensitive resin composition. |
| priorityDate | 2002-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 168.