http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2003056391-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2003056391-A1 |
| titleOfInvention | Radiation sensitive resin composition and pattern forming method |
| abstract | In the radiation-sensitive resin composition containing an alicyclic olefin resin having an acidic group, an acid generator, a crosslinking agent, and a solvent, the alicyclic olefin-based resin having an acidic group has a weight average molecular weight of less than 10,000. In some cases, the index C1 represented by the specific relational expression (1) is 300 or more, and when the weight average molecular weight is 10,000 or more, the index C2 represented by the specific relational expression (2) is 120 or more. Indicates. |
| priorityDate | 2001-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 288.