http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2003045915-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D487-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D409-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D487-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D487-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D487-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-48 |
| filingDate | 2002-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2003045915-A1 |
| titleOfInvention | Bisimide compound, acid generator using the same, resist composition, and pattern forming method using the composition |
| abstract | The present invention relates to an acid generator for a chemically amplified resist composition used in the manufacture of semiconductor elements and the like, a novel bisimide compound useful as a raw material for heat-resistant polymer synthesis, an acid generator using the same, and a resist. The present invention relates to a composition and a pattern forming method using the composition, and further to a bis (N-hydroxy) phthalimide compound useful as an intermediate of a bisimide compound, for example, an intermediate of a functional compound such as a heat-resistant polymer or a photosensitive material. “General formula [1] [Wherein R and A 1 are as defined in claim 1 , respectively], an acid generator using the same, a resist composition, and a pattern forming method using the composition] To do. |
| priorityDate | 2001-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 459.