http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2002073319-A1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2002-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2004-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2002073319-A1 |
titleOfInvention | Resist stripping composition |
abstract | A resist stripping composition comprising a nitro group-containing organic compound (A) and a resist stripping agent (B) is provided. When this composition is used, it is possible to remove a resist residue generated at the time of wiring formation in a manufacturing process of a semiconductor or an electronic circuit for a liquid crystal or the like with high performance, and to suppress corrosion of a silicon substrate or a thin film transistor. Corrosion of a-Si and p-Si which are constituent metals of the constituent can be satisfactorily prevented. |
priorityDate | 2001-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.