http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S649442-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 1987-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4faf79de53dc7aaa5621b9e8e959b06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f97d0948b3670022f2afc28e8e78560b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1de3f65e193af101b2f8f3cd72904cc
publicationDate 1989-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S649442-A
titleOfInvention Pattern forming material
abstract PURPOSE:To improve resistance of a pattern forming material to reactive ion etching effect of oxygen by using a silicone modified product of phenol resin. CONSTITUTION:An alkali-soluble resin (A) and a photo-cross-linking agent (B) are containing in the title material. A resin prepd. by modifying a phenol resin consisting of a phenolic compd. and an aldehydic compd. with a silicone compd. having a fundamental skeleton expressed by formula I, II, or III, is used for the resin (A). In the formulas, >=one substituent(s) of the formulas is(are) functional groups(s) (e.g., OH group, COOH group, alkoxy group, etc.); each a-e is an integer >=1. Further, 2,6-bis(4'-azidobenzal)cyclohexanone, etc. may be used for the crosslinking agent. By this constitution, a compsn. for top layer resist having high resistance to RIE effect of oxygen is obtd.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE37604-E
priorityDate 1987-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 22.