http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S649442-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1987-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4faf79de53dc7aaa5621b9e8e959b06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f97d0948b3670022f2afc28e8e78560b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1de3f65e193af101b2f8f3cd72904cc |
publicationDate | 1989-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-S649442-A |
titleOfInvention | Pattern forming material |
abstract | PURPOSE:To improve resistance of a pattern forming material to reactive ion etching effect of oxygen by using a silicone modified product of phenol resin. CONSTITUTION:An alkali-soluble resin (A) and a photo-cross-linking agent (B) are containing in the title material. A resin prepd. by modifying a phenol resin consisting of a phenolic compd. and an aldehydic compd. with a silicone compd. having a fundamental skeleton expressed by formula I, II, or III, is used for the resin (A). In the formulas, >=one substituent(s) of the formulas is(are) functional groups(s) (e.g., OH group, COOH group, alkoxy group, etc.); each a-e is an integer >=1. Further, 2,6-bis(4'-azidobenzal)cyclohexanone, etc. may be used for the crosslinking agent. By this constitution, a compsn. for top layer resist having high resistance to RIE effect of oxygen is obtd. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE37604-E |
priorityDate | 1987-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.