http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6487790-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate | 1987-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16a2d719653410984711fd8dba1e28c4 |
| publicationDate | 1989-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S6487790-A |
| titleOfInvention | Dry etching method |
| abstract | PURPOSE:To form a minute pattern with high precision and at a high rate by dissociating ions and radicals to form a plasma state, and loading an RF bias on a high-m.p. metal to be etched. CONSTITUTION:A microwave 1 and a magnetic field from a magnetic field generator 9 are exerted on a gas to fulfill the electron cyclotron resonance conditions to form a plasma state. An RF bias is impressed on an etching substrate 5 placed in the plasma thus excited by an RF bias source 7 through a working base 6, and loaded on the thin film of the high-m.p. metal. Accordingly, the gaseous CBrF3 introduced into an etching chamber 8 is dissociated into a CFx<+> ion and a Br radical. A negative floating potential is generated at this time on the surface of the etching substrate 5, and the dissociated CFx<+> ion is vertically injected into the thin film. As a result, the direction of the ion is controlled, and hence anisotropic etching is made possible. Consequently, the etching precision can be improved. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6296780-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9930360-A1 |
| priorityDate | 1987-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6384 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419547108 |
Total number of triples: 14.