http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6454443-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1987-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57ac23dff79ea84ec0f5149104275f52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08b682b25c4ac0809c6918004eee3ece http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f8cdcb3666e03b4813f8a1a61316f9 |
| publicationDate | 1989-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S6454443-A |
| titleOfInvention | Negative type resist |
| abstract | PURPOSE:To obtain the titled resist having the high oxygen plasma durability, resolution and sensitivity against UV by incorporating a specified polysiloxane in the titled resist. CONSTITUTION:The titled resist contains the polysiloxane shown by formula I wherein R1-R3 are each methyl or phenyl group, R4-R8 are each hydrogen atom or methyl group, at least one of the groups R4-R8 is methyl group, (n) is a positive integer, (m) is 0 or a positive integer. And, a bisazide compd. is preferably incorporated in the polysiloxane. Thus, the titled resist with the high oxygen plasma durability, resolution and the good sensitivity against UV, is obtd. |
| priorityDate | 1987-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.