| abstract |
PURPOSE:To obtain the positive type photoresist which has the high sensitivity for a UV and the high oxygen plasma durability by incorporating a specified orthonaphtoquinone compd. in a specified alkaline soluble siloxane polymer. CONSTITUTION:The titled composition contains one or more kinds of the alkaline soluble siloxane polymer shown by formulas I and II and a photosensitive agent shown by formula III. In formulas I, II and III, X is for example, carboxyl group, R1-R5 are each hydrogen atom. or alkyl group, etc., R6 is hydrogen atom. or aryl group, etc., R7 is alkyl or aryl group, etc., D is 1,2-naphthoquinone diazido-4-sulfonyl group or 1,2-naphthoquinone diazido-5-sulfonyl group. Thus, the positive type photoresist having reproducibility with the high accuracy and high oxygen plasma durability, is obtd. |