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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-30
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filingDate 1986-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdda33fd30a0f803085f085c65b8e57f
publicationDate 1988-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S6388438-A
titleOfInvention Mosfet chemical electrode
abstract PURPOSE: To enable stable operation as electrode, by covering the electrode with a resin film except for a exposed surface thereof through which gate metal senses chemical species. n CONSTITUTION: A P-type silicon wafer undergoes a patterning so that a channel are 4 set by a drain region 2 and a source region 3 is formed at a part on a substrate. Then, the entire surface of the silicon wafer is subjected to thermal oxidation except for a drain terminal setting section 21 and a source terminal setting section 31 thereof to form an oxide film. Moreover, a silicon nitride film is laminated on the film to obtain a MOSFET element 1. A gold or platinum film 7 is formed tight on a gate insulation film of the element 1 through a metal layer 6 made of chromium or titanium to form a gate material. Then, the work is covered with an insulating and water-resistant resin film at least except for a gate metal exposed at a part of a portion thereof corresponding to the area 4 so that chemical species in a solution to be measured only contact with the exposed part of gate metal, and none of other parts. This minimizes the amount of chemical species which permeates the film 7 to reach the metal layer 6. n COPYRIGHT: (C)1988,JPO&Japio
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priorityDate 1986-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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