http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6368832-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 1986-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6784855b1af14155c51004ed30707d9f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17c356c2ce9de274e6434afd5ee8798a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9efd414682a0d0d73c5c1a84e9390c1
publicationDate 1988-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S6368832-A
titleOfInvention Formation of pattern
abstract PURPOSE:To obtain high sensitivity and high definition to radiation by forming a resist layer contg. a polyorganosiloxane having a specific group on a flattened layer, projecting the radiation thereto and developing the resist layer, then etching the flattened layer. CONSTITUTION:The flattened layer is formed on a substrate and the resist layer contg. the polyorganosiloxane having the group expressed by formula I is formed on the flattened layer. After the resist layer is developed by the projection of the radiation, the flattened layer is etched. In formula I, R denotes a hydrocarbon residue of 1-15C, Y denotes formula II, X<1>-X<5> denote a hydrogen atom, alkyl group of 1-4C, alkoxy group of 1-4C, nitro group, halogen atom, etc. The high definition to the radiation is thereby obtd. and the pattern having a high shape ratio is formable.
priorityDate 1986-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458427722

Total number of triples: 18.