http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63218948-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72
filingDate 1987-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b826d1f4e68b694e2187d58559b75c7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_484f9ae83d61ede45bb91ec9d6ebce72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5335037ecf78862f31b5bff5fe3c44aa
publicationDate 1988-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S63218948-A
titleOfInvention Resist material
abstract PURPOSE:To obtain a positive type resist having high sensitivity to high energy rays by consisting the resist of alkali soluble siloxane polymers, self decomposition type polymer as a dissolution inhibitor, and onium salts as the decomposition accelerator thereof. CONSTITUTION:This material contains the siloxane polymers expressed by the formulas I, II, the polymer contg. the repeating unit expressed by the general formula III, and >=1 kinds of the onium salts expressed by the formula R<4>N2<+> MXa<->, R<4>R<5>I<+>MXa<->, R<4>R<5>R<6>S<+>MXa<-> (R<4>-R<6> denote an arom. group or substd. arom. group; MXa denotes BF4, PF6, etc.). In the formulas I, II, X denotes, for example, a carboxyl group; R1-R3 denote a hydroxyl group, alkyl group, etc.; l-n denote 0 or positive integer. The resist material which has the high sensitivity and resolution to high energy rays and has high dry etching resistance is thereby obtd.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8901268-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8864898-B2
priorityDate 1987-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397365
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458433298
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397310

Total number of triples: 20.