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filingDate 1987-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b9a8cef7b044efb5860daaf34640fac
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publicationDate 1988-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S63196296-A
titleOfInvention Production of muconic acid
abstract PURPOSE: To produce muconic acid from benzoic acid or catechol in high efficiency, by mixing a photo-polymerizable resin with a muconic acid-producing microbial strain, etc., in a solvent, polymerizing the resin with light and using the resultant included and immobilized microorganism for the production of the objective compound. n CONSTITUTION: (A) A resin containing a compound having photo-polymerizable ethylenic unsaturated groups bonded to both terminals of a polyalkylene glycol, e.g. a compound produced by adding hydroxyethyl acrylate to both terminals of polyethylene glycol or polypropylene glycol via isophorone diisocyanate is mixed with (B) a microbial strain capable of producing muconic acid from benzoic acid or catechol or treated product of said strain in a solvent. The obtained mixture is added with a photo-polymerization initiator and irradiated with light to obtain immobilized microorganism. Benzoic acid or catechol is made to react by using said immobilized product to form muconic acid, which is separated and purified by conventional process. n COPYRIGHT: (C)1988,JPO&Japio
priorityDate 1987-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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