http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63163846-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1986-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f8cdcb3666e03b4813f8a1a61316f9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57ac23dff79ea84ec0f5149104275f52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08b682b25c4ac0809c6918004eee3ece |
| publicationDate | 1988-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S63163846-A |
| titleOfInvention | Radiation sensitive resist and pattern forming method |
| abstract | PURPOSE:To permit formation of two-layered resist patterns by using a radiation sensitive resist which consists essentially of a specific polymer, permits development by an alkali developing soln. having the ability to suppress swelling during development and has excellent oxygen plasma resistance. CONSTITUTION:This radiation sensitive resist consists essentially of the polymer expressed by the formula. In the formula, R1-R4 may be the same or different and denote an alkyl group or phenyl group, Q denotes a hydrocarbon unit having at least >=1 arom. rings bonded with a hydroxyl group. The hydrocarbon unit having the arom. ring bonded with the hydroxyl group is introduced into the polymer expressed by the formula. According to such constitution, the resist consisting of said polymer can be developed by the alkali developing soln. with which the swelling during the development arises hardly. |
| priorityDate | 1986-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397310 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977 |
Total number of triples: 20.