| abstract |
PURPOSE:To form a resist pattern having superior definition by providing an intermediate layer comprising a mixture consisting of a specified silicone resin and a monoazide or bisazide compd. to a three layered resist. CONSTITUTION:A mixture consisting of a silicone resin expressed by the formula I with the monoazide or bisazide compd. is used for the intermediate layer of the three layered resist. In the formula I, R is a vinyl or allyl group; n is a positive integer, which is pref. 10-1,000, more pref. 50-500. Suitable material for the lowest layer of the three-layered resist is phenol-novolak resin, etc. On one hand, conventional resist may be used for the upper layer of the resist. By this method, a resist pattern having high resolution power can be formed. |