http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63107118-A

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Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-305
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 1986-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e74008f242497c8c60bf4a24cc6c6e5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53888d65f0a3df2d7b8fc747cb3771fe
publicationDate 1988-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S63107118-A
titleOfInvention Ion beam apparatus
abstract PURPOSE: To make it possible to form a maskless, high-speed pattern on a substrate having a large area, by a constitution wherein a plurality of beams are taken out of a plasma growing chamber, a means for converging the beams and a means for deflecting the beams are provided over the beams, and scanning can be performed individually on a the substrate based on control from the outside. n CONSTITUTION: When gas of Ar, CF 4 , CCl 4 or the like enters into a plasma chamber 13, the gas is made to be plasma with RF electric power, which is applied on RF coils 14 and 15. Ion beams are converged with grids 17a, 17b and 17c for taking out ions and accelerated. The ion beams that have been taken out pass between scanning electrodes 19a and 19b and reach a substrate 20. The scanning electrodes 19a and 19b are electrically controlled from the outside. The substrate 20 can be individually scanned with the beams 18. Pattern etching is performed with the ion beams reaching the substrate 20, which is provided on a susceptor 21. n COPYRIGHT: (C)1988,JPO&Japio
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100585937-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4563346-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011054993-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100328325-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007042609-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009006679-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007027097-A
priorityDate 1986-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.