http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63106649-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1986-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17c356c2ce9de274e6434afd5ee8798a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9efd414682a0d0d73c5c1a84e9390c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6784855b1af14155c51004ed30707d9f |
| publicationDate | 1988-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S63106649-A |
| titleOfInvention | Pattern forming method |
| abstract | PURPOSE:To form a fine resist pattern with high accuracy by forming a flattening layer on a substrate, and a resist layer contg. specific organopolysiloxane on the flattening layer, and by etching the flattening layer after radiating radiations and developing the resist. CONSTITUTION:The titled method lies in forming the flattening layer on the substrate, and forming the resist layer contg. the organopolysiloxane having the structure shown by formula 1 on the flattening layer, followed by etching the flattening layer, after radiating radiation and developing the resist layer. In formula I, R<1> and R<2> are each an aromatic compd. residual group or a heterocyclic ring compd. residual group, R<3> is 1-10C hydrocarbon residual group or 1-10C halogen hydrocarbon residual group, R<4> is 1-6C hydrocarbon residual group or 1-6C halogenated hydrocarbon residual group, X is hydroxy group or a group capable of hydrolysing, (a) and (b) are each 0 or 1. Thus, the high resolution of a photosensitive material against radiations can be obtd., and the pattern having a high shape ratio can be formed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008256966-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008203614-A |
| priorityDate | 1986-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397310 |
Total number of triples: 17.