Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33dafb5bbc2ec47ebcb7becbbe60f704 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03H1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
filingDate |
1985-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5ec7ab3b121f2f8aaeacf122ae29596 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c630784fe80bf1d50e1143ab3f072e74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86b09f744baa2f9d1e74b9bebcc16d0d |
publicationDate |
1987-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-S6295525-A |
titleOfInvention |
Photosensitive resin composition and method for preparing pattern using the composition |
abstract |
PURPOSE:To increase photochemical reaction velocity of a photosensitive resin compsn. by incorporating a polymer or copolymer containing >=2mol% specified structural unit and at least one compd. selected from aromatic aldehydes or aromatic ketones contg. unsubstituted or substituted group in the compsn. CONSTITUTION:The compsn. contains (A) a polymer or copolymer contg. >=2mol% structural unit expressed by the formula, and (B) at least one compd. selected from aromatic aldehydes and aromatic ketones having unsubstituted or substituted groups. Representative compd. (B) is unsubstituted or substituted benzaldehyde, benzophenone, or their derivs. The proportion of the polymer (A) to the compd. (B) may be selected optionally within a range from 10:1 to 1:10 by weight. The compd. (B) is selected optionally within a range from 10:1-1:20 more pref. 5:1-1:10 by molar ratio to the alcohol residue having nonconjugated double bond in the polymer (A). |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5038940-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S649447-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S649448-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6737460-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9726239-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H04222806-A |
priorityDate |
1985-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |