http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6231844-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ac17835c97e6c72213815ca74845386
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-00
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
filingDate 1985-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2cd0747e4f39da600d4da2dcab393dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a86f5a6a4529e6919144fca2e4eb6e4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a90f3c535d868dadf8b1fd96079fae2
publicationDate 1987-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S6231844-A
titleOfInvention Lithographic plate material
abstract PURPOSE:To obtain a lithographic plate material superior in photosensitivity to the visible rays and physical properties for printing by forming a photosensitive resin layer composed of an additionally polymerizable compound having an ethylenically unsaturated double bond and a specified photopolymerization initiation system on the hydrophilic surface of a support. CONSTITUTION:The photosensitive resin layer containing the additionally polymerizable compound having an ethylenically unsaturated double bond, such as an unsaturated carboxylic acid, and as the photopolymerization initiation system, xanthene or its derivative represented by the formula shown on the right and a photosensitivity promotor is formed on the hydrophilic surface of the support, such as Al, Zn, or Ni. In that formula, A is halogen; Y is a C or 0 atom, and when it is a C atom, the bond expressed with a dotted line is a double bond; Z is an 0 atom combined with an adjacent C atom through a double bond, lower alkoxy, or lower alkanoyloxy; R<1> is lower alkyl, lower hydroxyalkyl, lower-alkoxylated lower alkyl, di-(lower alkylamino)-(lower alkyl), or aryl; and R<2> is lower alkoxy or lower dialkylamino.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2042532-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2042928-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2236497-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1930770-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2042921-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3182204-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2177357-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009116442-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0315988-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1975707-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0466503-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2039509-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2109000-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2105797-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S62123450-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2048539-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02157761-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3051349-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1703323-A1
priorityDate 1985-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 40.