| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38520f366e74704305b34fb93a81121e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1986-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a0ea6d927e4c138a9b64bcc3d06cf07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f9c993b2fa3aa54f681a17c3189cecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2207f9cf4d60935339c52f1ce1c5bee8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04f8330435c3de57393a5bb3a817e904 |
| publicationDate |
1987-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-S62235942-A |
| titleOfInvention |
Negative type resist material |
| abstract |
PURPOSE:To obtain the titled material having high resistance against O2-RIE and high sensitivity against high energy rays such as electron rays and X rays by incorporating a specific compd. to the titled material. CONSTITUTION:The titled material is composed of allylsilsesquioxane (PAS) which is shown by formula I, and has trimethyl silyl group as the end group. The mol.wt. of the PAS is preferably 3,000-100,000. The titled material shows excellent characteristics by using it as an upper layer in two layer resist method. Especially, a fine pattern can be formed with a high through-put on a substrate having a complex difference in level via a relatively thick smoothing layer by using the titled resist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0582934-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63210839-A |
| priorityDate |
1986-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |