http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S62232647-A

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filingDate 1986-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d89f9de1781a72dfd20685b139b5aaa
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publicationDate 1987-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S62232647-A
titleOfInvention Pattern forming method
abstract PURPOSE:To form a pattern having high sensitivity and high resolution by providing a layer contg. a monomolecular film of a polymerizable compd. or the cumulative film thereof via an intermediate layer on a substrate and applying energy to said layer, thereby polymerizing the same to a pattern shape. CONSTITUTION:The layer contg. the monomolecular film 6 of the polymerizable compd. or the cumulative film 8 thereof is provided via the intermediate layer 20 on the substrate 5 and the energy is applied to the layers 6, 8 to polymerize the same to the pattern shape. The polymerizable compd. 1 used here is the compd. having respectively at least one hydrophilic parts 2, hydrophobic parts 3 and polymerizable parts 4 in the molecule. The polymerizable compd. 1 is preferably exemplified by a diacetylene deriv. compd. which is the compd. expressed by R-CidenticalC-CidenticalC-(R1)n-X, where R, R are the hydrophobic part, X is the hydrophilic part and n is 0 or 1.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6381424-A
priorityDate 1986-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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