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filingDate 1986-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_842151c5d218fd2c41c09157b138c2df
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publicationDate 1987-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S62225552-A
titleOfInvention Phenolic resin composition
abstract PURPOSE: A phenolic resin composition useful as a molding material or varnish, having improved solvent resistance and impact resistance, readily producible, comprising a radically polymerizable monomer, a phenolic resin and a radical polymerization catalyst as essential components. n CONSTITUTION: (A) 10W75wt% radically polymerizable monomer consisting of a polyfunctional monomer (ethylene glycol diacrylate, divinylbenzene, etc.) containing a carbon-carbon unsaturated double bond in the molecule and a monofunctional monomer (acrylic acid ester, styrene, etc.) containing one carbon- carbon unsaturated double bond, having 0.5W80wt% polyfunctional monomer ratio is blended with (B) novolak or resol phenolic resin and further (C) 0.05W15wt% based on the mixture of the components A and B of a radical polymerization catalyst, preferably azo type radical polymerization catalyst to give the aimed composition. The blend is further mixed with a curing agent such as hexamine, etc., in the case where the component B is the novolak phenolic resin. n COPYRIGHT: (C)1987,JPO&Japio
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