http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S62215552-A

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filingDate 1986-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be5f2f05bc04f2767aa318a3e0868dbf
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publicationDate 1987-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S62215552-A
titleOfInvention Diamine having photosensitive group and production thereof
abstract NEW MATERIAL:A diamine of formula having a photosensitive group. n EXAMPLE: 1,4-Bis[2-(3-aminobenzoyl)ethenyl]benzene. n USE: A raw material for heat-resistant photo-sensitive resin such as polyimide, polyamide, polyamide imide, etc. n PREPARATION: A diamine of formula having photosensitive group can be produced by carrying out dehydrative condensation of terephthalamide with m- aminoacetophenone or p-aminoacetophenone in an inert solvent (preferably 1W5C aliphatic monocarboxylic acid) in the presence of a polyvalent inorganic acid (preferably sulfuric acid or phosphoric acid) as a catalyst and neutralizing the obtained salt. n COPYRIGHT: (C)1987,JPO&Japio
priorityDate 1986-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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