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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
filingDate 1985-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e33c412fbd3d1aae63f029d58455cd27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d16daf8790f029a0bddd219a084ba5a
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publicationDate 1987-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S62156103-A
titleOfInvention Photopolymerizable composition
abstract PURPOSE:To provide a photopolymerizable composition having high sensitivity, sensitive to visible light and useful as a resist material, photosensitive resin letterpress, etc., by using a compound having specific isoalloxazine skeleton and an organic peroxide as photopolymerization initiators. CONSTITUTION:The objective composition is composed of an addition- polymerizable compound having >=1 terminal ethylenic unsaturated group (e.g. acrylic acid, ethylene glycol diacrylate, etc.) and a photopolymerization initiator system consisting of a combination of a compound having isoalloxazine skeleton of formula (R1 and R2 are H or 1-5C alkyl) (e.g. riboflavin, riboflavin tetrabutyrate, etc.) and an organic peroxide (e.g. methyl ethyl ketone peroxide). EFFECT:It is sensitive in a visible range of 450-500nm wavelength and can be polymerized by argon ion laser.
priorityDate 1985-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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