http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6172231-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-00 |
| filingDate | 1984-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2d51952d4090354a0cea56848c08af3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_decdd7b9a53244a3f56f269bca4ea40b |
| publicationDate | 1986-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S6172231-A |
| titleOfInvention | Negative type organosiloxane resist |
| abstract | PURPOSE:To obtain a pattern having high resolution by using specified organopolysiloxane as a resist for high energy beams. CONSTITUTION:Organopolysiloxane represented by the formula and having 0.15-1 million average mol.wt. and a distribution of polymn. degree represented by specific dispersion Mw/Mn<=2.5 is used as a resist for high energy beams. When the amount of phenyl groups is <=10mol%, the flowage of the polysiloxane after exposure is not well prevented. When the amount is >=60mol%, the flowage is well prevented, but he sensitivity to irradiation is so reduced that the introduction of vinyl groups can not compensate for the reduction, so it is required to regulate the amount of methyl groups to 40-90mol% and the amount of phenyl groups to 10-60mol%. Vinyl groups are introduced by such an amount as to compensate for reduction of the sensitivity due to the introduction of phenyl groups, and the gamma is reduced by increasing the amount of vinyl groups, so the amount of vinyl groups is regulated to <=1mol%, preferably <=0.5mol%. |
| priorityDate | 1984-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.