| abstract |
PURPOSE: To reduce HF in HCl to ≤ an allowable value as an impurity by a sample operation, by bringing a HF-containing HCl gas into contact with a silane (derivative) containing a nonionic hydroxyl group-containing compound. n CONSTITUTION: A HCl gas containing about 20W30ppm HF, produced as a by-product during production of trichlorotrifluoroethane, is introduced to and brought into contact with reagent for removal of HF, comprising 9W96wt% nonionic hydroxyl group-containing compound such as 1W5C mono- W polyfunctional alcohol (e.g., ethanol, or glycerin), and if necessary, 0.03W5wt% chlorinated hydrocarbon (e.g., CHCl 3 ), chlorosilane (e.g., SiHCl 3 ), or chlorosilane derivative (e.g., phenyltrichlorosilane), so that HF in HCl is reduced to 2W3ppm. n COPYRIGHT: (C)1986,JPO&Japio |