http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S61279852-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1985-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a13215a0c6407bc80d177c297a3eea49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d16a51e7ae8ecda1ae7b8de343e691ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4330bb3b6975bcedf49425ef0d8ff32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4e4a0429466df1e0e488f2176cab62d |
| publicationDate | 1986-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S61279852-A |
| titleOfInvention | Photosensitive heat resistant material |
| abstract | PURPOSE:To enhance heat resistance of a photosensitive material and to enable microfabrication by incorporating terminal hydroxyphenylated ladder polysiloxane (HPLS) having specified photosensitive groups as side chains and a photosensitizer. CONSTITUTION:The terminal hydroxyphenylated ladder polysiloxane (HPLS) has at least 2 photosensitive groups in one molecule as side chains represented by the formula shown on the right in which X is H, methyl, or phenyl, and n is 0-4. This compound (HPLSV) obtained by attaching said side chains to HPLS can be obtained, for example, by hydrolyzing phenyltrichlorosilane and vinyltrichlorosilane. A mixture of this compound HPLSV and the photosensitizer is applied to a glass plate or the like, and exposed to form a pattern, thus permitting the obtained photosensitive material to be hardened by exposure and enhanced in heat resistance, and accordingly, this photosensitive material to be used for forming an insulating layer or a passivated layer and this layer to be microfabricated. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0299955-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10319597-A |
| priorityDate | 1985-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.