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filingDate 1985-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85b2ca359e6b174a7d5a9359092e0bc2
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publicationDate 1986-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S61271269-A
titleOfInvention Photo-sensitive monomer and photo-sensitive polymer
abstract PURPOSE: To provide a photo-sensitive monomer and photo-sensitive polymer having high reactivity and useful as a resin component of paint and adhesive, by reacting an acyl isocyanate having vinyl group with a compound containing active hydrogen and having photo-sensitive group. n CONSTITUTION: A monomer having a vinyl group and a photo-sensitive group bonded with the vinyl group via an acylurethane bond, acylthiourethane bond or acylurea bond can be produced by reacting the isocyanate compound of formula (R is H or methyl) (e.g. methacryloyl isocyanate) with a compound containing active hydrogen and having a photo-sensitive group (e.g. benzoin) in the presence or absence of a solvent (e.g. dichloroethane) at normal temperature. The monomer is polymerized optionally with other polymerizable monomers, or the compound of formula is polymerized with other polymerizable monomers and the polymer is made to react with a compound containing active hydrogen and having a photo-sensitive group to obtain the objective photo-sensitive polymer wherein the photo-sensitive group is bonded in the form of a pendant via the above bond such as acylurethane bond. n COPYRIGHT: (C)1986,JPO&Japio
priorityDate 1985-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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